FREE CONSULTATION714-578-6100
  1. Home
  2. Glove Boxes
  3. Overview and Applications
  4. Isolation Glove Boxes
  5. Photoresist Deposition Isolator

Photoresist Deposition Isolator

Photoresist Deposition Isolator

Photoresist Deposition Isolator illustration

Radius corners
allow easy cleaning
Photoresist Deposition Isolator rounded corners
Application Requirements
  • Temperature: 68°F (20°C) constant (requires cooling)
  • Humidity: 5 - 10% RH
  • Process Gas: Various gas mixtures
  • Pressure: 0.1" WG
  • Access: Accordion sleeve gloves; dual-side air locks; Bottom clean-out
  • Particle Control: Class 10 conditions, maintained by laminar flow of HEPA-filtered gas, recirculated via sub-floor & rear plenum chambers
Designed to provide a clean, moisture-free environment for applying photoresist, this isolator is large enough to accommodate wafer spinners used in the deposition process.
 
It incorporates a high-volume process gas mixer that controls percentages of two process gases. A three-sided plenum design recirculates the process gas through dual filter/fan modules for HEPA filtration (99.99% efficient @ 0.3µm particles). Magnehelic® gauges and backpressure alarms ensure filter/fan efficiency. In addition, the bottom plenum includes cooling coils that compensate for heat-generating process equipment to ensure a constant temperature of 68°F (20°C).
 
Dual-side air locks afford easy loading and unloading of wafers. The radius corners of all internal seams allow easy wipe-down and eliminate cracks where particles can collect.
Click to leave a message. 24-hour sales and tech phone support, M - F
Go to...
Go To
Laboratory-Equipment.com