Terra Part # 2001-05
$22,870

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Designed in the USA

• Approximate dimensions: 60.5"W x 36"D x 58"H (1537 x 914 x 1473 mm)

• Dimensions: 60" (1524 mm) overall length

• Number of panels: four (4)

• Standard deck accommodates cut-outs up to 23.75"D (603 mm)- (cut-out widths depends on station width) - user must specify configuration at time of order

• Welded stainless steel 1.5" x 3" ( 38 x 76 mm) tubing

• Electrical 120VAC, 60Hz, single phase.

• Prefilter; Throw-away replacement type located on top section

• Final filters; 99.99% efficeint HEPA (@ 0.3 µm particles)

• Optional Vertical Laminar Flow Module available.

Electrical Specifications: 120 V, 1 Ph, 60 Hz

Dimensions, Product: 60.5" W x 36" D x 58" H

Weight, Product: 650 lb

Dimensions, Shipping: 68" W x 66" D x 42" H

Weight, Shipping: 850 lb

Package Type: Crate

Unit of Measure: EA

Features and Benefits

Wet Processing: Which Material is Best?
Process Control, Safety, and Consistency
Polypropylene
  • Economical plastic with broad chemical compatibility
  • Ideal for wet processing station panels
  • Loses some chemical resistance at high temperatures
  • Suitable for HF and KOH processes
Quartz
  • The preferred material for ultra-pure applications
  • Provides greater uniformity in heat transfer than plastic baths—ideal for very tight temperature control
  • Suitable for most chemicals (but not HF acid)
  • Hard surfaces won’t scuff, stain, or absorb impurities
PVDF (polyvinyldilene fluoride)
  • Broader range of chemical resistance than polypropylene
  • Suitable for high process temperatures
  • Ideal for HF and BOE processes at high temperatures
PTFE (Teflon®)
  • Resistant to an extremely wide range of chemicals
  • Perfect for KOH and HF acid (which etch quartz)
  • Softer than quartz, so care must be taken to avoid scuffing, staining

Terra’s comprehensive range of constant-temperature baths, etching baths, dump risers, and other processing equipment is ideally suited for the high-purity requirements of the semiconductor industry. Microprocessor controls ensure the integrity of your operations.

The chart below indicates the baths best suited for common semiconductor operations. Once you select the equipment that meets your requirements, a Terra process engineer will help configure a turnkey solution.

Product Application Chart
Commercial or Generic Name Process Chemical Composition Concentration Typical Temperature Recommended Product
Aqua Regia Gold Etchant Hydrochloric Acid (HCl)
Nitric Acid (HNO3)
75%
25%
90° C Series
Buffered Oxide
Etch (BOE)
Etch SiO2 Ammonium Fluoride (NH4F) Aqueous
Hydrofluoric Acid (HF) Aqueous
40% 15-40°C
Ambient
A Series
RCe Series
CP8 Etch Nitric Acid (HNO3)
Hydrofluoric Acid (HF)
  Ambient A Series
Etch (Indium)
Molybdenum Platinum
Nichrome
Etch Hydrochloric Acid (HCl) Aqueous
Nitric Acid (HNO3)
37-38%
70-71%
  QA Series
Metal Etch Etch A,
AlSi Al Si Cu
Phosphoric Acid (H3PO4)
Acetic Acid (CH3COOH)
Nitric Acid (HNO3)
85-87% 30-60°C QA Series
Nitride Etch Etch Phosphoric Acid (H3PO4)
DI Water (H20)
85-87%
15-13%
150-185°C Nb Series
Organic Stripper Resist Removal PRS-1000
S-43
Lozolin
No Phenol-922
Full strength Room Temperature
120°C
Nb Series
Oxide Resist Strip SiO2 Resist Stripping Sulfuric Acid (H2SO4)
Ammonium Persulfate (NH4S2O2)
95-96% QA Series
Phenolic Stripper Resist Removal J100
Bermar 712D
R-10
  95-100°C C Series
Resist Series (Metalized) Resist Removal Chromic Sulfuric Acid (CrO3+H2SO4)     A Series
R.C.A. Clean Pre-Diffusion Cleans
Quartzware
Step 1: Water
Hydrogen Peroxide (H2O2)
Ammonium Fuoride (NH4CH)
Step 2: DI Water (H2O)
Hydrogen Peroxide (H2O2)
Hydrochloric Acid (HCL)
40% 75-85°C Qa Series
Silicon Etch Etch Acetic Acid (CH3COOH)
Nitric Acid (HNO3)
HydroFuoric Acid (HF)
  Ambient A Series
Sirtl Etch Etch Chromium Trioxide (CrO3)
DI Water (H20)
Hydrofluoric Acid (HF)
  Ambient A Series
Slope Etch Etch Phosphoric Acid (H3PO4)
Acetic Acid (CH3COOH)
Nitric Acid (HNO3)
  55°C Qa Series
Standard Resist Strip (do not use w/aluminum) SiO2 Resist Strip Sulfuric Acid (H2SO4)
Hydrogen Peroxide (H2O2)
95-96% 110-140°C Qa Series
2:1 Etch Etch DI Water (H2O)
Hydrofuoric Acid (HF)
  Ambient A Series
Wafer Rinsing Rinsing DI Water (H2O) 100% Ambient DR-Series
Particle Trapping Test

N2 and DI Water Spray Guns

Handy spray guns provide a ready sources of nitrogen or deionized water installed in locations to suit your process requirements (shown: DI water spray gun installed on cleaning station).

Gooseneck Faucet

Angled to dispense water in a focused stream, this faucet is made of chemical-resistant PVC

Adjustable Rear Baffles

Adjust air flow direction, speed and volume by changing position of the easy-to-reach baffle plates at the rear of the station countertop.

On a tight schedule? Choose FasTrak 24/7 Priority Service to help meet your critical schedule for Terra-manufactured products, either before or after your order is placed.*

  • FasTrak 24/7 provides a 24/7 commitment to meet the shipping date YOU specify, regardless of quoted lead times.
  • FasTrak 24/7 assigns a dedicated production team plus a dedicated senior expeditor working three shifts to meet your delivery specification.
  • FasTrak 24/7 guarantees* to meet the agreed-to specified ship date.

Call for pricing. FasTrak service fees cover costs of additional services only, without additional profit.

 * Terra's FasTrak services limited guarantee: to ship on the ESD or date specified OR to refund up to 100% of FasTrak charges. This guarantee covers no direct, special, consequential or other damages and is strictly limited to up to 100% of the amount paid for FasTrak service. When a specified ship date is missed due to factors outside Terra's control (vendor performance, deliveries by shipping companies, etc.) and random factors such as accidents, the credit of up to 100% of the FasTrak 24/7 may not apply. FasTrak service requested after order placement will be quoted and accepted based on available time remaining before required ship date.

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