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Wafer Processing Baths, Tanks and Rinsers

Programmable modules made of chemical-reisistant materials are designed with safety and ergonomic features to improve workflow.

Quartz Baths

Quartz Baths

Ultra-pure quartz baths for etching, stripping and cleaning semiconductor wafers. Increase process yield with uniform bath heating and safety features

Filtered Etch Bath

Filtered Etch Bath

The recirculating, filtered bath is ideal for buffered oxide etch (positive resist develop) in semiconductor wet processing applications using HF acid.

Silicon Nitride Etch Bath

Silicon Nitride Etch Bath

Etch semiconductor wafers with the silicon nitride etch bath made of flame-polished 99.995% pure quartz. Heat and chemical/water ratio remain stable

Solvent Baths

Solvent Baths

Remove wafer photoresist and other strong solvent deposits in these baths for Class I, Div 2 hazardous conditions; temperature is stable for safest results

Teflon Processing Tanks

Teflon Processing Tanks

Use Teflon tanks for silicon wafer processes including KOH and TMAH etching. Non-contaminating tanks stand up to the punishment of strong chemicals

Wafer Quick Dump Rinser

Wafer Quick Dump Rinser

Rinse silicon wafers free of acids, solvents and other wet-processing chemicals with the quick dump rinser, designed to prevent overspray of DI water

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