The NB Series Silicon Nitride Etch Bath is ideal for etching
silicon nitride layers in a heated process solution of phosphoric
acid and DI water.
It heats the acid/water process solution to the process set
point. Rather than injecting water once the set point is reached,
it monitors the temperatures both of the solution and the
vapor. As the process solution heats beyond its set point,
DI water is injected into the process solution to replace
water lost through vaporization. If either setting is not
reached, as in the case of an open cover, an interlock prevents
This dual protection guards against bumping: layering the DI
water on top of the acid. You benefit from excellent bath-to-batch
consistency and a high degree of operator safety.
Terra offers a comprehensive range of constant temperature baths, etching baths, and dump rinsers to meet other size and temperature requirements. Call to discuss your application.