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  5. Solvent Baths

Wet Processing Solvent Baths

  • Stainless steel wet processing baths for wafer clean-up
  • For use with strong solvents that remove photoresist
  • Efficient, uniform heating controlled to reduce potential damage
  • Safety switch protects personnel safety
  • Modular design for easy installation or upgrade
  • One-year warranty
These robust baths are designed for wafer clean-up to remove stubborn photoresist and residual deposits from etching and other fabrication processes. Baths are made from 316 stainless steel with housing of stainless steel or an FM4910-approved material for longevity, safety and reliability. Insulation is made from high-density alumina silica fiber, rated to 1260°C.

Solvent baths are appropriate for use with all chemical solvents, including isopropyl alcohol (IPA), acetone and 1-Methyl-2-pyrrolidon. A Teflon®-encapsulated J-type process thermocouple delivers heat to the bath and increases the temperature 2°C per minute. The operating temperature is 30°C to 100°C (86°F to 212°F); controlled to +/- 1°C. Multi-sided heating elements ensure uniform temperature for consistent results.

Series Sa Solvent Baths
These basic solvent baths are designed to meet Class I, Division 2, Group D requirements for hazardous chemicals. They provide temperature at a constant level, with a heating element that covers five sides of the bath. The sloped flange design is seamless to hinder contaminant build-up.

Series SFa Solvent Baths
Advanced SFa Series baths work with controller C1915 or equivalent (order separately). The four-sided heating element is controlled to a set-point, as higher temperatures enhance chemical reactions and speed. A recirculator adds kinetics to increase efficiency and reaction time. Series SFa meets Class I, Div 2 Group D (includes acetone, ammonia, ethanol/methanol) requirements. A 360-degree serrated overflow weir ensures safety and chemical economy.

Both Series operate at 208VAC, 50/60 Hz, single phase, 7-20 amps.

Options:
Liquid sensing level, stainless steel diffuser plate, temperature controller, autolid, magnetic stirrer, aspirator valve system, gravity drain, process controller or remote timer switches.

Solvent Baths installed in
Manual Wafer Processing Bench
Semi-Automated Wafer Processing Bench
Fully Automated Wafer Processing Bench

Processing Modules
Models below accommodate a single wafer cassette. Other sizes and configurations are available; talk to a Terra Product Specialist. Installation charged separately; will vary based on the complexity of the processing station.
Cat. # Price
Sa Series constant temperature, 6" single 7018-60 Call TUI
SFa Series temperature controlled recirculating , 6" single 7018-61 Call TUI
Corresponding Controls
x=Standard
o=Optional
Heat Cool Liquid
Level
Sensor
Alarm
Timer Over/
Under
Temp
Alarm
Recirc.
Pump
Switch
Drain
Valve
Control
Spray
Nozzle
Control
DI H2O
Injection
Cat. # Price
C1915a x   x x   x o     7018-62 Call TUI
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