 |
|
|
- Provides
a clean, moisture-free environment for applying photoresist.
- Large
enough to accommodate wafer spinners used in the deposition
process.
- Incorporates
a high-volume process gas mixer.
- Three-sided
plenum design recirculates the process gas through dual
filter/fan modules for HEPA filtration (99.99% efficient
@ 0.3µm particles).
- Bottom
plenum includes cooling coils that compensate for heat-generating
process equipment.
- Radius
corners of all internal seams allow easy wipe-down and
eliminate cracks where particles can collect.
|
|
|
