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Material

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Work Area Width

ISO Class

Terra Part # Price Ships in
Polypropylene 13" 13" ISO 7 2800-75 38715 $2,008 20-26 Days 2
Polypropylene 13" 18" ISO 7 2800-76 38716 $2,237 20-26 Days 3
Polypropylene 13" 25" ISO 7 2800-77 38717 $3,321 20-26 Days 4
Material
Work Area Depth
Work Area Width
ISO Class
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Up to 30-day trial periods, free return shipping and on-site training available for qualified equipment.

Request demo from your product specialist or add note to your order or quote request.

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Custom-configured product. Contact Terra by phone, chat or email for a project-specific quote.
Custom-configured product. Contact Terra by phone, chat or email for a project-specific quote.
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Product Details
Product Details
  • Available ISO Ratings: ISO 7, ISO 8

Available ISO Ratings: ISO 7, ISO 8

ISO Class: ISO 7

Unit of Measure: of 1

Features & Benefits

Features & Benefits

Learn More: Wet Processing Materials

Process Control, Safety, and Consistency

Polypropylene

  • Economical plastic with broad chemical compatibility
  • Ideal for wet processing station panels
  • Loses some chemical resistance at high temperatures
  • Suitable for HF and KOH processes

Quartz

  • The preferred material for ultra-pure applications
  • Provides greater uniformity in heat transfer than plastic baths—ideal for very tight temperature control
  • Suitable for most chemicals (but not HF acid)
  • Hard surfaces won’t scuff, stain, or absorb impurities

PVDF (polyvinyldilene fluoride)

  • Broader range of chemical resistance than polypropylene
  • Suitable for high process temperatures
  • Ideal for HF and BOE processes at high temperatures

PTFE (Teflon®)

  • Resistant to an extremely wide range of chemicals
  • Perfect for KOH and HF acid (which etch quartz)
  • Softer than quartz, so care must be taken to avoid scuffing, staining

Terra’s comprehensive range of constant-temperature baths, etching baths, dump risers, and other processing equipment is ideally suited for the high-purity requirements of the semiconductor industry. Microprocessor controls ensure the integrity of your operations.

The chart below indicates the baths best suited for common semiconductor operations. Once you select the equipment that meets your requirements, a Terra process engineer will help configure a turnkey solution.

Product Application Chart

Commercial or Generic Name Process Chemical Composition Concentration Typical Temperature Recommended Product
Aqua Regia Gold Etchant Hydrochloric Acid (HCl)
Nitric Acid (HNO3)
75%
25%
90° C Series
Buffered Oxide
Etch (BOE)
Etch SiO2 Ammonium Fluoride (NH4F) Aqueous
Hydrofluoric Acid (HF) Aqueous
40% 15-40°C
Ambient
A Series
RCe Series
CP8 Etch Nitric Acid (HNO3)
Hydrofluoric Acid (HF)
  Ambient A Series
Etch (Indium)
Molybdenum Platinum
Nichrome
Etch Hydrochloric Acid (HCl) Aqueous
Nitric Acid (HNO3)
37-38%
70-71%
  QA Series
Metal Etch Etch A,
AlSi Al Si Cu
Phosphoric Acid (H3PO4)
Acetic Acid (CH3COOH)
Nitric Acid (HNO3)
85-87% 30-60°C QA Series
Nitride Etch Etch Phosphoric Acid (H3PO4)
DI Water (H20)
85-87%
15-13%
150-185°C Nb Series
Organic Stripper Resist Removal PRS-1000
S-43
Lozolin
No Phenol-922
Full strength Room Temperature
120°C
Nb Series
Oxide Resist Strip SiO2 Resist Stripping Sulfuric Acid (H2SO4)
Ammonium Persulfate (NH4S2O2)
95-96% QA Series
Phenolic Stripper Resist Removal J100
Bermar 712D
R-10
  95-100°C C Series
Resist Series (Metalized) Resist Removal Chromic Sulfuric Acid (CrO3+H2SO4)     A Series
R.C.A. Clean Pre-Diffusion Cleans
Quartzware
Step 1: Water
Hydrogen Peroxide (H2O2)
Ammonium Fuoride (NH4CH)
Step 2: DI Water (H2O)
Hydrogen Peroxide (H2O2)
Hydrochloric Acid (HCL)
40% 75-85°C Qa Series
Silicon Etch Etch Acetic Acid (CH3COOH)
Nitric Acid (HNO3)
HydroFuoric Acid (HF)
  Ambient A Series
Sirtl Etch Etch Chromium Trioxide (CrO3)
DI Water (H20)
Hydrofluoric Acid (HF)
  Ambient A Series
Slope Etch Etch Phosphoric Acid (H3PO4)
Acetic Acid (CH3COOH)
Nitric Acid (HNO3)
  55°C Qa Series
Standard Resist Strip (do not use w/aluminum) SiO2 Resist Strip Sulfuric Acid (H2SO4)
Hydrogen Peroxide (H2O2)
95-96% 110-140°C Qa Series
2:1 Etch Etch DI Water (H2O)
Hydrofuoric Acid (HF)
  Ambient A Series
Wafer Rinsing Rinsing DI Water (H2O) 100% Ambient DR-Series

Products Compliant With Your ISO Rating

Provide Terra with your desired ISO rating. We will tailor the product to meet your rating and supply a certificate of compliance appended to your invoice, to be included in your compliance package. All certificates are archived in Terra's system for quick retrieval.

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