Terra Part # 7018-00
$25,761

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19636
Wet Cleaning Station; 84"W x 43"D x 72"H, Polypropylene

• Overall Dimensions: 84"W x 43"D x 72"H (2134 mm x 1092 mm x 1829 mm); Work Area Dimensions: 72"W x 24"D (1829 mm x 610 mm)

• Material: Stress-relieved white polypropylene, 1/2" (13 mm) thick

• Standard plumbing is PVC (specify stainless steel or other desired material)

• Exhaust is ducted through a standard 10" (254 mm)-diameter flange positioned at the top rear of cabinet

• (specify other desired flange diameter or location)

• Instrument panel provides power switch, power indicating light, light switch, static pressure

• Exhaust meter and power fuse

Type: Cleaning Station

Material: Polypropylene

Work Area Width: 72"

Work Area Depth: 24"

Unit of Measure: EA

Weight, Product: 843 lb

Dimensions, Product: 84" W x 43" D x 72" H

Weight, Shipping: 1,050 lb

Dimensions, Shipping: 49" W x 90" D x 84" H

Package Type: Crate

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Features and Benefits

Wet Processing: Which Material is Best?
Process Control, Safety, and Consistency
Polypropylene
  • Economical plastic with broad chemical compatibility
  • Ideal for wet processing station panels
  • Loses some chemical resistance at high temperatures
  • Suitable for HF and KOH processes
Quartz
  • The preferred material for ultra-pure applications
  • Provides greater uniformity in heat transfer than plastic baths—ideal for very tight temperature control
  • Suitable for most chemicals (but not HF acid)
  • Hard surfaces won’t scuff, stain, or absorb impurities
PVDF (polyvinyldilene fluoride)
  • Broader range of chemical resistance than polypropylene
  • Suitable for high process temperatures
  • Ideal for HF and BOE processes at high temperatures
PTFE (Teflon®)
  • Resistant to an extremely wide range of chemicals
  • Perfect for KOH and HF acid (which etch quartz)
  • Softer than quartz, so care must be taken to avoid scuffing, staining

Terra’s comprehensive range of constant-temperature baths, etching baths, dump risers, and other processing equipment is ideally suited for the high-purity requirements of the semiconductor industry. Microprocessor controls ensure the integrity of your operations.

The chart below indicates the baths best suited for common semiconductor operations. Once you select the equipment that meets your requirements, a Terra process engineer will help configure a turnkey solution.

Product Application Chart
Commercial or Generic NameProcessChemical CompositionConcentrationTypical TemperatureRecommended Product
Aqua RegiaGold EtchantHydrochloric Acid (HCl)
Nitric Acid (HNO3)
75%
25%
90°C Series
Buffered Oxide
Etch (BOE)
Etch SiO2Ammonium Fluoride (NH4F) Aqueous
Hydrofluoric Acid (HF) Aqueous
40%15-40°C
Ambient
A Series
RCe Series
CP8EtchNitric Acid (HNO3)
Hydrofluoric Acid (HF)
 AmbientA Series
Etch (Indium)
Molybdenum Platinum
Nichrome
EtchHydrochloric Acid (HCl) Aqueous
Nitric Acid (HNO3)
37-38%
70-71%
 QA Series
Metal EtchEtch A,
AlSi Al Si Cu
Phosphoric Acid (H3PO4)
Acetic Acid (CH3COOH)
Nitric Acid (HNO3)
85-87%30-60°CQA Series
Nitride EtchEtchPhosphoric Acid (H3PO4)
DI Water (H20)
85-87%
15-13%
150-185°CNb Series
Organic StripperResist RemovalPRS-1000
S-43
Lozolin
No Phenol-922
Full strengthRoom Temperature
120°C
Nb Series
Oxide Resist StripSiO2 Resist StrippingSulfuric Acid (H2SO4)
Ammonium Persulfate (NH4S2O2)
95-96%QA Series
Phenolic StripperResist RemovalJ100
Bermar 712D
R-10
 95-100°CC Series
Resist Series (Metalized)Resist RemovalChromic Sulfuric Acid (CrO3+H2SO4)  A Series
R.C.A. CleanPre-Diffusion Cleans
Quartzware
Step 1: Water
Hydrogen Peroxide (H2O2)
Ammonium Fuoride (NH4CH)
Step 2: DI Water (H2O)
Hydrogen Peroxide (H2O2)
Hydrochloric Acid (HCL)
40%75-85°CQa Series
Silicon EtchEtchAcetic Acid (CH3COOH)
Nitric Acid (HNO3)
HydroFuoric Acid (HF)
 AmbientA Series
Sirtl EtchEtchChromium Trioxide (CrO3)
DI Water (H20)
Hydrofluoric Acid (HF)
 AmbientA Series
Slope EtchEtchPhosphoric Acid (H3PO4)
Acetic Acid (CH3COOH)
Nitric Acid (HNO3)
 55°CQa Series
Standard Resist Strip (do not use w/aluminum)SiO2 Resist StripSulfuric Acid (H2SO4)
Hydrogen Peroxide (H2O2)
95-96%110-140°CQa Series
2:1 EtchEtchDI Water (H2O)
Hydrofuoric Acid (HF)
 AmbientA Series
Wafer RinsingRinsingDI Water (H2O)100%AmbientDR-Series
Particle Trapping Test

On a tight schedule? Choose FasTrak 24/7 Priority Service to help meet your critical schedule for Terra-manufactured products, either before or after your order is placed.*

  • FasTrak 24/7 provides a 24/7 commitment to meet the shipping date YOU specify, regardless of quoted lead times.
  • FasTrak 24/7 assigns a dedicated production team plus a dedicated senior expeditor working three shifts to meet your delivery specification.
  • FasTrak 24/7 guarantees* to meet the agreed-to specified ship date.

Call for pricing. FasTrak service fees cover costs of additional services only, without additional profit.

 * Terra's FasTrak services limited guarantee: to ship on the ESD or date specified OR to refund up to 100% of FasTrak charges. This guarantee covers no direct, special, consequential or other damages and is strictly limited to up to 100% of the amount paid for FasTrak service. When a specified ship date is missed due to factors outside Terra's control (vendor performance, deliveries by shipping companies, etc.) and random factors such as accidents, the credit of up to 100% of the FasTrak 24/7 may not apply. FasTrak service requested after order placement will be quoted and accepted based on available time remaining before required ship date.

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