• Type: Cleaning Station
• Material: Polypropylene
• Work Area Width: 96"
• Work Area Depth: 24"
• Available Certified ISO Grade Designs: ISO 6, ISO 7, ISO 8
• Certified ISO Grade Design: ISO 6
• ISO Rated Air Cleanliness: ISO 5
• Unit of Measure: EA
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Terra’s comprehensive range of constant-temperature baths, etching baths, dump risers, and other processing equipment is ideally suited for the high-purity requirements of the semiconductor industry. Microprocessor controls ensure the integrity of your operations.
The chart below indicates the baths best suited for common semiconductor operations. Once you select the equipment that meets your requirements, a Terra process engineer will help configure a turnkey solution.
| Commercial or Generic Name | Process | Chemical Composition | Concentration | Typical Temperature | Recommended Product |
|---|---|---|---|---|---|
| Aqua Regia | Gold Etchant | Hydrochloric Acid (HCl) Nitric Acid (HNO3) | 75% 25% | 90° | C Series |
| Buffered Oxide Etch (BOE) | Etch SiO2 | Ammonium Fluoride (NH4F) Aqueous Hydrofluoric Acid (HF) Aqueous | 40% | 15-40°C Ambient | A Series RCe Series |
| CP8 | Etch | Nitric Acid (HNO3) Hydrofluoric Acid (HF) | Ambient | A Series | |
| Etch (Indium) Molybdenum Platinum Nichrome | Etch | Hydrochloric Acid (HCl) Aqueous Nitric Acid (HNO3) | 37-38% 70-71% | QA Series | |
| Metal Etch | Etch A, AlSi Al Si Cu | Phosphoric Acid (H3PO4) Acetic Acid (CH3COOH) Nitric Acid (HNO3) | 85-87% | 30-60°C | QA Series |
| Nitride Etch | Etch | Phosphoric Acid (H3PO4) DI Water (H20) | 85-87% 15-13% | 150-185°C | Nb Series |
| Organic Stripper | Resist Removal | PRS-1000 S-43 Lozolin No Phenol-922 | Full strength | Room Temperature 120°C | Nb Series |
| Oxide Resist Strip | SiO2 Resist Stripping | Sulfuric Acid (H2SO4) Ammonium Persulfate (NH4S2O2) | 95-96% | QA Series | |
| Phenolic Stripper | Resist Removal | J100 Bermar 712D R-10 | 95-100°C | C Series | |
| Resist Series (Metalized) | Resist Removal | Chromic Sulfuric Acid (CrO3+H2SO4) | A Series | ||
| R.C.A. Clean | Pre-Diffusion Cleans Quartzware | Step 1: Water Hydrogen Peroxide (H2O2) Ammonium Fuoride (NH4CH) Step 2: DI Water (H2O) Hydrogen Peroxide (H2O2) Hydrochloric Acid (HCL) | 40% | 75-85°C | Qa Series |
| Silicon Etch | Etch | Acetic Acid (CH3COOH) Nitric Acid (HNO3) HydroFuoric Acid (HF) | Ambient | A Series | |
| Sirtl Etch | Etch | Chromium Trioxide (CrO3) DI Water (H20) Hydrofluoric Acid (HF) | Ambient | A Series | |
| Slope Etch | Etch | Phosphoric Acid (H3PO4) Acetic Acid (CH3COOH) Nitric Acid (HNO3) | 55°C | Qa Series | |
| Standard Resist Strip (do not use w/aluminum) | SiO2 Resist Strip | Sulfuric Acid (H2SO4) Hydrogen Peroxide (H2O2) | 95-96% | 110-140°C | Qa Series |
| 2:1 Etch | Etch | DI Water (H2O) Hydrofuoric Acid (HF) | Ambient | A Series | |
| Wafer Rinsing | Rinsing | DI Water (H2O) | 100% | Ambient | DR-Series |
On a tight schedule? Choose FasTrak 24/7 Priority Service to help meet your critical schedule for Terra-manufactured products, either before or after your order is placed.*
Call for pricing. FasTrak service fees cover costs of additional services only, without additional profit.
* Terra's FasTrak services limited guarantee: to ship on the ESD or date specified OR to refund up to 100% of FasTrak charges. This guarantee covers no direct, special, consequential or other damages and is strictly limited to up to 100% of the amount paid for FasTrak service. When a specified ship date is missed due to factors outside Terra's control (vendor performance, deliveries by shipping companies, etc.) and random factors such as accidents, the credit of up to 100% of the FasTrak 24/7 may not apply. FasTrak service requested after order placement will be quoted and accepted based on available time remaining before required ship date.
