Designed to provide a clean, moisture-free environment for applying photoresist, this glove box is large enough to accommodate wafer spinners used in the deposition process.

 

It incorporates a high-volume process gas mixer that controls percentages of two process gases. A three-sided plenum design recirculates the process gas through dual filter/fan modules for HEPA filtration (99.99% efficient @ 0.3µm particles). Magnehelic® gauges and backpressure alarms ensure filter/fan efficiency. In addition, the bottom plenum includes cooling coils that compensate for heat-generating process equipment to ensure a constant temperature of 68°F (20°C).

 

Dual-side air locks afford easy loading and unloading of wafers. The radius corners of all internal seams allow easy wipe-down and eliminate cracks where particles can collect.